Image:Wafertraksystem.jpg

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[edit] Summary

An aligner is a major piece of equipment used in semiconductor device fabrication. Trending from upper left to lower right is the wafer-track system of a photolithographic aligner that uses the "i-line" from a mercury arc lamp (wavelength 365 nm) to expose photoresist deposited on silicon wafers. Wafers are robotically loaded from a carrier at the left hand of the system and progressively are coated with photoresist, exposed to ultraviolet light, and "developed". The development step involves using a solvent to remove either the exposed (positive photoresist) or unexposed (negative photoresist) portions of the film. In the foreground is a black plastic box containing silicon wafers with a diameter of 6" (125 mm).

Photo taken at HP Labs by Alison Chaiken using a Nikon 995 camera. Note that the light in the room really is yellow!


[edit] Licensing

GNU head Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation license, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled "GNU Free Documentation license".

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Date/TimeDimensionsUserComment
current02:11, 3 February 20062,048×1,536 (577 KB)Chaiken (An '''aligner''' is a major piece of equipment used in semiconductor device fabrication.Trending from upper left to lower right is the wafer-track system of a photolithographic aligner that us)
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Metadata

This file contains additional information, probably added from the digital camera or scanner used to create or digitize it. If the file has been modified from its original state, some details may not fully reflect the modified file.

Camera manufacturer NIKON
Camera model E995
Exposure time 2/55 sec (0.036363636363636)
F-number f/2.7
Date and time of data generation 21:05, 31 January 2006
Lens focal length 8.9 mm
Orientation Normal
Horizontal resolution 300 dpi
Vertical resolution 300 dpi
Software used E995v1.7
File change date and time 21:05, 31 January 2006
Y and C positioning 2
Exposure Program Normal program
ISO speed rating 100
Exif version 2.1
Date and time of digitizing 21:05, 31 January 2006
Image compression mode 2
Exposure bias 0
Maximum land aperture 2.8
Metering mode Pattern
Light source Unknown
Flash 0
Color space sRGB