Image:Resolution vs. DOF.JPG

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Resolution_vs._DOF.JPG‎ (708 × 512 pixels, file size: 28 KB, MIME type: image/jpeg)

[edit] Summary

This is a plot showing the Rayeligh resolution limit, measured in nanometers, as a function of depth of focus, for the current DUV lithography tools. KrF means 248 nm wavelength, ArF means 193 nm wavelength. "Wet" means water is used as the imaging medium (n=1.44), while "Dry" means air is used (n=1). The depth of focus formula used is 0.25*wavelength/(sin(angle/2))^2, where n*sin(angle) equals the numerical aperture. The resolution limit forumula used is 0.6*wavelength/(numerical aperture).

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I, the copyright holder of this work, hereby publish it under the following licenses: This file is licensed under the Creative Commons Attribution-ShareAlike license versions 3.0, 2.5, 2.0, and 1.0. Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. You may select the license of your choice.

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