Image:GT Nanotech Building.jpg
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[edit] Summary
Project sign at the site of the construction of the Georgia Tech Nanotechnology Research Center Building on the corner of Ferst Drive and Atlantic Avenue in Atlanta, Georgia.
[edit] Licensing
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I, the copyright holder of this work, hereby release it into the public domain. This applies worldwide. In case this is not legally possible, |
File history
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| Date/Time | Dimensions | User | Comment | |
|---|---|---|---|---|
| current | 06:38, 11 January 2007 | 2,048×1,536 (589 KB) | LaMenta3 (Talk | contribs) | (Project sign at the site of the construction of the Georgia Tech Nanotechnology Research Center Building on the corner of Ferst Drive and Atlantic Avenue in Atlanta, Georgia.) |
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Metadata
This file contains additional information, probably added from the digital camera or scanner used to create or digitize it. If the file has been modified from its original state, some details may not fully reflect the modified file.
| Camera manufacturer | SONY |
|---|---|
| Camera model | DSC-P72 |
| Exposure time | 1/40 sec (0.025) |
| F-number | f/4 |
| Date and time of data generation | 03:04, 4 September 2006 |
| Lens focal length | 11.6 mm |
| Orientation | Normal |
| Horizontal resolution | 72 dpi |
| Vertical resolution | 72 dpi |
| Software used | Adobe Photoshop CS2 Windows |
| File change date and time | 01:33, 11 January 2007 |
| Y and C positioning | 2 |
| Custom image processing | Normal process |
| Exposure mode | Auto exposure |
| White balance | Auto white balance |
| Scene capture type | Standard |
| Exposure Program | Normal program |
| ISO speed rating | 200 |
| Exif version | 2.2 |
| Date and time of digitizing | 03:04, 4 September 2006 |
| Image compression mode | 4 |
| Exposure bias | 0 |
| Maximum land aperture | 3 |
| Metering mode | Pattern |
| Light source | Unknown |
| Flash | 29 |
| Color space | sRGB |
